プレプリント / バージョン1

Free software for general prediction of interface chemical bonding at metal – oxide interface: InterChemBond - updated

##article.authors##

DOI:

https://doi.org/10.51094/jxiv.339

キーワード:

metal – oxide interface、 interface chemistry、 thermodynamic equilibrium、 interface reaction、 prediction software

抄録

The updated functions of a free software for general prediction of interface chemical bonding at metal – oxide interface, InterChemBond, is reported. So far, the interface between pure metal or alloy and 19 oxides without considering interface reaction was implemented in InterChemBond. With the current update, the number of oxides available for the prediction has become 83 in total, and a new prediction mode that considers interface reactions has been implemented. The principle of the prediction for the added oxides is explained. The principles and formula for predicting interface bonding with considering interface reactions are provided as well as some dump screens of the software.

利益相反に関する開示

The author declares no potential conflict of interests.

ダウンロード *前日までの集計結果を表示します

ダウンロード実績データは、公開の翌日以降に作成されます。

引用文献

U. Alber, H. Mullejans, and M. Ruhle, Micron 30, 101–108 (1999); doi: 10.1016/S0968-4328(99)00013-X

V. Merlin and M. Eustathopoulos, J. Mater. Sci. 30, 3619–3624 (1995); doi: 10.1007/BF00351875

D. Chantain, F. Chabert, V. Ghetta, and J. Fouletier, J. Am. Ceram. Soc. 77, 197–201 (1994); doi: 10.1111/j.1151-2916.1994.tb06977.x

S. Shi, S. Tanaka, and M. Kohyama, Phys. Rev. B76, 075431 (2007); doi: 10.1103/PhysRevB.76.075431

S. Shi, S. Tanaka and M. Kohyama, J. Amer. Ceram. Soc. 90, 2429–2440 (2007); doi: 10.1111/j.1551-2916.2007.01769.x

S. Shi, S. Tanaka, and M. Kohyama, Mater. Trans. 47, 2696–2700 (2006); doi: 10.2320/matertrans.47.2696

K. Shiraishi, T. Nakayama, T. Nakaoka, A. Ohta, and S. Miyazaki, ECS Trans. 13, 21–27 (2008); doi: 10.1149/1.2908612

T. Nagata, P. Ahmet, Y. Z. Yoo, K. Yamada, K. Tsutsui, Y. Wada, and T. Chikyow, Appl. Surf. Sci. 252, 2503–2506 (2006); doi: 10.1016/j.apsusc.2005.05.085

A. Asthagiri, C. Niederberger, A. J. Francis, L. M. Porter, P. A. Salvador, and D. S. Sholl, Surf. Sci. 537, 134–152 (2003); doi: 10.1016/S0039-6028(03)00609-5

M. Yoshitake, S. Nemsak, T. Skala, N. Tsud, T. Kim, V. Matolin, and K. C. Prince, Surf. Sci. 604, 2150–2156 (2010); doi: 10.1016/j.susc.2010.09.007

K. Ip, G. T. Thaler, H. Yang, S. Y. Han, Y. Li, D. P. Norton, S. J. Pearton, S. Jang, F. Ren, J. Crystal Growth, 287, 149–156 (2006); doi: 10.1016/j.jcrysgro.2005.10.059

S. J. Young, L. W. Ji, S. J. Chang, Y. K. Su, J. Crystal Growth, 293, 43–47 (2006); doi: 10.1016/j.jcrysgro.2006.03.059

T. K. Lin, S. J. Chang, Y. K. Su, B. R. Huang, M. Fujita, and Y. Horikoshi, J. Crystal Growth, 281, 513–517 (2005); doi: 10.1016/j.jcrysgro.2005.04.056

M. Yoshitake, S. Yagyu, and T. Chikyow, J. Vac. Sci. Technol. A32, 021102 (2014); doi: 10.1116/1.4849375

M. Yoshitake, S. Yagyu, and T. Chikyow, International Journal of Metals, 2014, 120840, (2014); doi: 10.1155/2014/120840

M. Yoshitake, J. Vac. Sci. Technol. A 39, 063217 (2021); doi: 10.1116/6.0001312

M. Yoshitake, Jxiv, 2022; doi: 10.51094/jxiv.192

https://interchembond.nims.go.jp

M.Yoshitake, Y-R. Aparna and K. Yoshihara, J. Vac. Sci. Technol. A19, 1432 (2001); doi: 10.1116/1.1376699

M.Yoshitake, Jpn. J. Appl. Phys. 51, 085601 (2012); doi: 10.1143/JJAP.51.08560

ダウンロード

公開済


投稿日時: 2023-03-22 12:40:32 UTC

公開日時: 2023-03-23 08:25:20 UTC
研究分野
ナノ・材料科学